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Extra info for Advanced Ceramic Technologies & Products
High productivity is achieved with this method because targets do not have to be replaced frequently, allowing for continuous operation. This method allows for film production on large substrates. In the CVD method, gasified raw material compounds are made to chemically react by means of thermal decomposition, oxidation, or reduction in the gas phase to create a thin film with intended chemical composition on the substrate. 7 Although structures and characteristics of the created thin film vary depending on physical and chemical properties of the raw material compounds, and complicated compositions are difficult to control with this method, it has advantages such as high step coverage and the capability to create high quality thin films on large substrates.
1) indicates that the speed becomes faster by 103–104 times when the grain diameter is reduced to 1/10. High-purity raw materials are required for high performance materials. The drop in diffusion coefficients due to high purity can be compensated for by the microparticulation of raw powders. Because of these reasons, fine raw powders are used in the production of fine ceramics. 1 Blending of Powders for Sintering Sinterability largely depends on the powder manufacturing conditions. Densification at low temperatures leads to low production costs and realizes fine microstructure with superior functions.
The composition of the precursor solution is readily transferred to the thin film, allowing easy control of the composition, and films can be formed on large substrates using this method. The electrophoretic deposition method is a solution based method that is suitable for producing films on substrates with complicated shapes. Ceramic thin films are used in the electronics field for sensors, surface acoustic wave filters, bulk acoustic wave filters, transparent electrodes, memory capacitors, etc.
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