Read e-book online Advances in Geometric Modeling and Processing: 5th PDF

By Juncong Lin, Xiaogang Jin, Zhengwen Fan, Charlie C. L. Wang (auth.), Falai Chen, Bert Jüttler (eds.)

ISBN-10: 3540792457

ISBN-13: 9783540792451

ISBN-10: 3540792465

ISBN-13: 9783540792468

This booklet constitutes the refereed lawsuits of the fifth foreign convention on Geometric Modeling and Processing, GMP 2008, held in Hangzhou, China, in April 2008.

The 34 revised complete papers and 17 revised brief papers offered have been conscientiously reviewed and chosen from a complete of 113 submissions. The papers hide a large spectrum within the quarter of geometric modeling and processing and deal with issues corresponding to curves and surfaces, electronic geometry processing, geometric function modeling and popularity, geometric constraint fixing, geometric optimization, multiresolution modeling, and functions in computing device imaginative and prescient, picture processing, medical visualization, robotics and opposite engineering.

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Read Online or Download Advances in Geometric Modeling and Processing: 5th International Conference, GMP 2008, Hangzhou, China, April 23-25, 2008. Proceedings PDF

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Additional info for Advances in Geometric Modeling and Processing: 5th International Conference, GMP 2008, Hangzhou, China, April 23-25, 2008. Proceedings

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E. no restriction of the number of patches joining around a common vertex, and it doesn’t make any restriction on the input data. Furthermore, it gives explicit formulas for all control points, no linear system has to be solved. 1 G1 Continuity Notations A cubic B´ezier curve is defined by B(t) = 3i=0 bi Bi3 (t), t ∈ [0, 1] ⊂ IR where 3−i i the bi ∈ IR3 are the B´ezier control points and Bi3 (t) = 3i (1 − t) t are cubic Berstein polynomials. A bicubic tensor product B´ezier patch is define by 3 3 bij Bi3 (u)Bj3 (v), (u, v) ∈ [0, 1]2 ⊂ IR2 .

Given a Loop patch S of valence n and an error tolerance after k = min λlj + j 0≤j≤λ−1 > 0, (14) steps of subdivision on the control mesh of S, the distance between S and its level-k limit mesh is smaller than . Here, lj = log r 1 λ (n) rj (n) max{β(n), 13 }M , In particular, for regular Loop patches, k = log4 0 ≤ j ≤ λ − 1, λ ≥ 1 . M 3 . 44 Z. Huang and G. Wang 6 Comparison Both a control mesh and its corresponding limit mesh can be employed to approximate a Loop surface in practical applications.

El-Sana Several approaches have been proposed to reduce the topologic complexity of polygonal meshes. In most approaches, the simplification process has effects on topology that are hard to predict and analyze. Proximity-based methods, such as pair-collapse [10] [18] and clustering [17] [19], are based on proximity between vertices. They allow topological changes and aggregation but do not identify and remove parts of the surface that become internal. Thus, they may end up complicating topology rather than simplifying it.

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Advances in Geometric Modeling and Processing: 5th International Conference, GMP 2008, Hangzhou, China, April 23-25, 2008. Proceedings by Juncong Lin, Xiaogang Jin, Zhengwen Fan, Charlie C. L. Wang (auth.), Falai Chen, Bert Jüttler (eds.)


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